Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masayoshi Sagehashi0
Jun Hatakeyama0
Koji Hasegawa0
Date of Patent
May 28, 2019
0Patent Application Number
155855310
Date Filed
May 3, 2017
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A positive resist composition based on a polymer comprising recurring units (a) of (meth)acrylate having an iodized lactone ring, and recurring units (b1) having a carboxyl group substituted with an acid labile group and/or recurring units (b2) having a phenolic hydroxyl group substituted with an acid labile group has a high sensitivity and resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
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