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US Patent 10303056 Resist composition and patterning process
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Patent
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Date Filed
May 3, 2017
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Date of Patent
May 28, 2019
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Patent Application Number
15585531
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Patent Citations Received
US Patent 11940728 Molecular resist composition and patterning process
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US Patent 11506977 Positive resist composition and patterning process
US Patent 11567406 Positive resist composition and patterning process
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US Patent 11586110 Positive resist composition and patterning process
US Patent 11604411 Resist composition and patterning process
US Patent 11635690 Positive resist composition and patterning process
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US Patent 11860540 Positive resist composition and patterning process
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US Patent 11493843 Resist composition and patterning process
Patent Inventor Names
Masayoshi Sagehashi
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Jun Hatakeyama
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Koji Hasegawa
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10303056
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Patent Primary Examiner
Martin J. Angebranndt
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