A positive resist composition based on a polymer comprising recurring units (a) of (meth)acrylate having an iodized lactone ring, and recurring units (b1) having a carboxyl group substituted with an acid labile group and/or recurring units (b2) having a phenolic hydroxyl group substituted with an acid labile group has a high sensitivity and resolution, and forms a pattern of good profile and minimal edge roughness after exposure.

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Jun Hatakeyama0

Koji Hasegawa0

Masayoshi Sagehashi0

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https://pdfpiw.uspto.gov/.piw?Docid=103030560

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Patent Citations Received

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US Patent 11635690 Positive resist composition and patterning process

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Patent Citations Received

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US Patent 11586110 Positive resist composition and patterning process

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Patent Citations Received

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US Patent 11493843 Resist composition and patterning process

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US Patent 11604411 Resist composition and patterning process

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Patent Citations Received

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US Patent 11506977 Positive resist composition and patterning process

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US Patent 11604411 Resist composition and patterning process

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US Patent 11586110 Positive resist composition and patterning process

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US Patent 11567406 Positive resist composition and patterning process

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US Patent 11506977 Positive resist composition and patterning process

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US Patent 11493843 Resist composition and patterning process

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Is a

Patent

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

103030560

Date of Patent

May 28, 2019

Patent Application Number

155855310

Date Filed

May 3, 2017

Official Website

https://pdfpiw.uspto.gov/.piw?Docid=103030560

Patent Primary Examiner

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Martin J. Angebranndt

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US Patent 10303056 Resist composition and patterning process

Infobox

Is a

Patent

Patent jurisdiction

United States Patent and Trademark Office

Patent number

10303056

Date of patent

May 28, 2019

Patent application number

15585531

Date Filed

May 3, 2017

Patent primary examiner

‌

Martin J. Angebranndt

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