US Patent 11609088 Systems and methods for measuring patterns on a substrate

Disclosed herein is a method of measuring a pattern on a substrate comprising: preparing a substrate having a relief pattern comprising organic or inorganic material; directing an excitation light to the relief pattern on the substrate to emit a fluorescent light from the relief pattern; detecting an intensity of the fluorescent light emitted from the relief pattern; and determining a volume of the relief pattern on the substrate based on the detected intensity of the fluorescent light.