US Patent 11635690 Positive resist composition and patterning process
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US Patent 11635690 Positive resist composition and patterning process
Article
A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of fluorosulfonic acid having an iodized or brominated aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
Infobox
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Patent Jurisdiction
Patent Number
116356900
Date of Patent
April 25, 2023
0Patent Application Number
169164530
Date Filed
June 30, 2020
0Patent Citations
Patent Primary Examiner
CPC Code
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