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US Patent 11664188 Edge detection system
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Patent
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Date Filed
May 10, 2021
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Date of Patent
May 30, 2023
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Patent Application Number
17316106
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Patent Citations
US Patent 11216938 Systems and methods of optimal metrology guidance
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US Patent 11415897 Calibrating stochastic signals in compact modeling
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US Patent 11416977 Self-measurement of semiconductor image using deep learning
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US Patent 11422096 Surface topography measurement apparatus and method
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US Patent 11461889 Pattern inspection apparatus and pattern inspection method
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US Patent 11468553 System and method for determining type and size of defects on blank reticles
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US Patent 11501420 Reconstructing phase images with deep learning
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US Patent 7124395 Automatic optical proximity correction (OPC) rule generation
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US Patent 7175940 Method of two dimensional feature model calibration and optimization
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US Patent 7247574 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
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•••
Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11664188
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Patent Primary Examiner
Nicole M Ippolito
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CPC Code
G06T 7/13
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G06T 2207/10061
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G06T 2207/30148
0
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