US Patent 11669008 Extreme ultraviolet mask blank defect reduction methods
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US Patent 11669008 Extreme ultraviolet mask blank defect reduction methods
Article
Methods for the manufacture of extreme ultraviolet (EUV) mask blanks and production systems therefor are disclosed. A method for forming an EUV mask blank comprises forming a bilayer on a portion of a multi-cathode PVD chamber interior and then forming a multilayer stack of Si/Mo on a substrate in the multi-cathode PVD chamber.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
116690080
Date of Patent
June 6, 2023
0Patent Application Number
170771760
Date Filed
October 22, 2020
0Patent Citations
Patent Primary Examiner
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