US Patent 9773665 Particle reduction in a physical vapor deposition chamber

Patent 9773665 was granted and assigned to Applied Materials on September, 2017 by the United States Patent and Trademark Office.

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Patent

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Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

9773665

Date of Patent

September 26, 2017

Patent Application Number

15371142

Date Filed

December 6, 2016

Patent Citations Received

‌

US Patent 11669008 Extreme ultraviolet mask blank defect reduction methods

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Patent abstract

Methods and apparatus for reducing particles generated in a process carried out in a process chamber are provided herein. In some embodiments, a process kit shield includes: a body having a surface facing a processing volume of a physical vapor deposition (PVD) process chamber, wherein the body is composed of aluminum oxide (Al2O3); and a silicon nitride layer on the surface of the body.

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