US Patent 9773665 Particle reduction in a physical vapor deposition chamber
Patent 9773665 was granted and assigned to Applied Materials on September, 2017 by the United States Patent and Trademark Office.
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Patent abstract
Methods and apparatus for reducing particles generated in a process carried out in a process chamber are provided herein. In some embodiments, a process kit shield includes: a body having a surface facing a processing volume of a physical vapor deposition (PVD) process chamber, wherein the body is composed of aluminum oxide (Al2O3); and a silicon nitride layer on the surface of the body.
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US Patent 09773665 Particle reduction in a physical vapor deposition chamber US Patent 9773665 Particle reduction in a physical vapor deposition chamber
Infobox
Patent Number
0977366500
Patent Number
977366500
Edits on 27 Mar, 2023
Golden AI
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
097736650
Date of Patent
September 26, 2017
0Patent Application Number
153711420
Date Filed
December 6, 2016
0Patent Primary Examiner
0
Edits on 27 Sep, 2022
Golden AI
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
097736650
Date of Patent
September 26, 2017
0Patent Application Number
153711420
Date Filed
December 6, 2016
0Patent Primary Examiner
0
Edits on 15 Jan, 2022
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US Patent 09773665 Particle reduction in a physical vapor deposition chamber
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
09773665
Date of patent
September 26, 2017
Patent application number
15371142
Date Filed
December 6, 2016
Patent primary examiner
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