Various implementations described herein are directed to a device having a multi-tiered memory structure with a first tier and a second tier arranged vertically in a stacked configuration. The device may have multiple transistors disposed in the multi-tiered memory structure with first transistors disposed in the first tier and second transistors disposed in the second tier. The device may have a single interconnect that vertically couples the first transistors in the first tier to the second transistors in the second tier.