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US Patent 11670707 Integrated assemblies and methods of forming integrated assemblies

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Is a
Patent
Patent
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Patent attributes

Patent Applicant
Micron Technology
Micron Technology
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Current Assignee
Micron Technology
Micron Technology
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
116707070
Date of Patent
June 6, 2023
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Patent Application Number
178402500
Date Filed
June 14, 2022
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Patent Citations
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US Patent 9276092 Transistors and methods of forming transistors
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US Patent 9276134 Field effect transistor constructions and memory arrays
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US Patent 9337210 Vertical ferroelectric field effect transistor constructions, constructions comprising a pair of vertical ferroelectric field effect transistors, vertical strings of ferroelectric field effect transistors, and vertical strings of laterally opposing pairs of vertical ferroelectric field effect transistors
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US Patent 9678037 Two-dimensional material-based field-effect transistor sensors
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Patent Primary Examiner
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Richard A Booth
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CPC Code
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H01L 21/02527
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H01L 21/02568
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H01L 27/10808
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H01L 27/10855
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H01L 27/10873
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H01L 27/10897
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H01L 27/11507
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H01L 27/11509
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Some embodiments include an integrated assembly having a conductive structure, an annular structure extending through the conductive structure, and an active-material-structure lining an interior periphery of the annular structure. The annular structure includes dielectric material. The active-material-structure includes two-dimensional-material. Some embodiments include methods of forming integrated assemblies.

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