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US Patent 11673226 Retaining ring for CMP

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Current Assignee
Applied Materials
Applied Materials
0
Date Filed
June 7, 2019
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Date of Patent
June 13, 2023
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Patent Applicant
Applied Materials
Applied Materials
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Patent Application Number
16435302
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Patent Citations
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US Patent 7857683 CMP retaining ring
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US Patent 8388412 Retaining ring with shaped profile
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US Patent 9539696 Retainer ring, polish apparatus, and polish method
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US Patent 10322492 Retaining ring for CMP
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US Patent 9815171 Substrate holder, polishing apparatus, polishing method, and retaining ring
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US Patent 7121927 Retaining ring structure for edge control during chemical-mechanical polishing
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US Patent 7326105 Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces
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US Patent 7347767 Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces
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US Patent 7520795 Grooved retaining ring
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US Patent 7575504 Retaining ring, flexible membrane for applying load to a retaining ring, and retaining ring assembly
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11673226
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Patent Primary Examiner
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Eileen P. Morgan
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CPC Code
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H01L 21/67063
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B24B 37/32
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H01L 21/68735
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H01L 21/67092
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H01L 21/30625
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