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US Patent 11686951 Reducing speckle in an excimer light source

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
April 26, 2021
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Date of Patent
June 27, 2023
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Patent Application Number
17240050
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Patent Citations
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US Patent 7728955 Lithographic apparatus, radiation supply and device manufacturing method
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US Patent 8014432 Regenerative ring resonator
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US Patent 8089672 Array element device control method and apparatus
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US Patent 8320056 Spatial filters for high average power lasers
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US Patent 8432529 Lithographic apparatus and monitoring method
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US Patent 8508716 Homogenizer
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US Patent 8624209 Controlling spatial properties in an excimer ring amplifier
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US Patent 8675699 Laser pulse synthesis system
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US Patent 8681427 System and method for separating a main pulse and a pre-pulse beam from a laser source
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US Patent 8938706 Providing customized visualization of application binary interface/application programming interface-related information
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11686951
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Patent Primary Examiner
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William R Alexander
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CPC Code
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H01S 4/00
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H01S 3/0085
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H01S 3/225
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H01S 3/0057
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G03F 7/70008
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G03F 7/70041
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G03F 7/7055
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G02B 27/48
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G01J 3/027
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G01J 9/02
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