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US Patent 11709425 Resist composition and method of forming resist pattern

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Date of Patent

July 25, 2023

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Patent Application Number

164208280

Date Filed

May 23, 2019

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Patent Citations

US Patent 8900791 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition

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US Patent 9023584 Radiation-sensitive composition, and compound

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US Patent 9052592 Resist composition and resist pattern forming method

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US Patent 9122154 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent

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US Patent 9128370 Radiation-sensitive composition and compound

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US Patent 9354515 Resist composition, acid generator, polymeric compound and method of forming resist pattern

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US Patent 9766541 Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound

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US Patent 10221131 Acid generator compounds and photoresists comprising same

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