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US Patent 11710648 Drying environments for reducing substrate defects

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Current Assignee
Applied Materials
Applied Materials
0
Date Filed
August 2, 2022
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Date of Patent
July 25, 2023
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Patent Applicant
Applied Materials
Applied Materials
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Patent Application Number
17878907
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Patent Citations
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US Patent 8869422 Methods and apparatus for marangoni substrate drying using a vapor knife manifold
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US Patent 9728428 Single use rinse in a linear Marangoni drier
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US Patent 9997384 Methods for transporting wafers between wafer holders and chambers
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US Patent 9984867 Systems and methods for rinsing and drying substrates
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US Patent 7513062 Single wafer dryer and drying methods
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US Patent 7718011 Apparatus for cleaning and drying substrates
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US Patent 7980255 Single wafer dryer and drying methods
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US Patent 8308529 High throughput chemical mechanical polishing system
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US Patent 8322045 Single wafer apparatus for drying semiconductor substrates using an inert gas air-knife
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11710648
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Patent Primary Examiner
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David J Laux
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CPC Code
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H01L 21/67772
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H01L 21/68764
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H01L 21/67034
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B08B 3/04
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B08B 3/102
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B08B 3/02
0
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H01L 21/67051
0

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