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US Patent 11715692 Microelectronic devices including conductive rails, and related methods

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Is a
Patent
Patent
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Patent attributes

Patent Applicant
Micron Technology
Micron Technology
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Current Assignee
Micron Technology
Micron Technology
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
117156920
Date of Patent
August 1, 2023
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Patent Application Number
169905800
Date Filed
August 11, 2020
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Patent Citations
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US Patent 9177853 Barrier layer stack for bit line air gap formation
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US Patent 9337203 Semiconductor device with line-type air gaps and method for fabricating the same
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US Patent 9425200 Semiconductor device including air gaps and method for fabricating the same
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US Patent 9460958 Air gap isolation in non-volatile memory
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US Patent 9524779 Three dimensional vertical NAND device with floating gates
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US Patent 9524904 Early bit line air gap formation
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US Patent 9698149 Non-volatile memory with flat cell structures and air gap isolation
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US Patent 9786598 Semiconductor device with air gaps and method for fabricating the same
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...
Patent Primary Examiner
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Tony Tran
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CPC Code
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H01L 45/146
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H01L 27/0688
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H01L 27/1021
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H01L 27/2409
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H01L 45/1233
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A microelectronic device comprises a stack structure comprising alternating conductive structures and insulative structures arranged in tiers, each of the tiers individually comprising a conductive structure and an insulative structure, strings of memory cells vertically extending through the stack structure, the strings of memory cells comprising a channel material vertically extending through the stack structure, and conductive rails laterally adjacent to the conductive structures of the stack structure. The conductive rails comprise a material composition that is different than a material composition of the conductive structures of the stack structure. Related memory devices, electronic systems, and methods are also described.

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