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US Patent 11756187 Systems and methods of optimal metrology guidance
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Patent
Date Filed
January 3, 2022
Date of Patent
September 12, 2023
Patent Application Number
17567847
Patent Citations
US Patent 8461527 Scanning electron microscope and method for processing an image obtained by the scanning electron microscope
US Patent 9213894 Image evaluation device, image evaluation method and program storage medium
US Patent 9518932 Metrology optimized inspection
US Patent 9823586 Inspection apparatus, inspection method and manufacturing method
US Patent 10488188 System and method for removing noise from roughness measurements
US Patent 10510509 Edge detection system
US Patent 10522322 System and method for generating and analyzing roughness measurements
US Patent 10656532 Edge detection system and its use for optical proximity correction
US Patent 10648801 System and method for generating and analyzing roughness measurements and their use for process monitoring and control
US Patent 10664955 Edge detection system and its use for machine learning
•••
Patent Inventor Names
Wentian Zhou
Teng Wang
Nan Zhao
Wei Fang
Ming Xu
Lingling Pu
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11756187
Patent Primary Examiner
Ian L Lemieux
CPC Code
G06T 7/0002
G06T 7/001
G06T 7/60
H01L 22/12
G06T 5/002
G06T 2207/30168
G06T 2207/30148
G06T 2207/10061
G03F 7/7065
G03F 7/70625
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