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US Patent 11761117 SiC single crystal sublimation growth apparatus
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Patent
Date Filed
September 15, 2021
Date of Patent
September 19, 2023
Patent Application Number
17447742
Patent Citations
US Patent 7396411 Apparatus for manufacturing single crystal
US Patent 7387680 Method and apparatus for the production of silicon carbide crystals
US Patent 7767022 Method of annealing a sublimation grown crystal
US Patent 7217322 Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer
US Patent 7316746 Crystals for a semiconductor radiation detector and method for making the crystals
Patent Inventor Names
Edward Semenas
Ilya Zwieback
Patrick Flynn
Marcus Getkin
Avinash Gupta
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11761117
Patent Primary Examiner
Hua Qi
CPC Code
C30B 29/36
C30B 23/066
C30B 23/06
C30B 23/005
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