US Patent 11782337 Multilayer extreme ultraviolet reflectors
Patent 11782337 was granted and assigned to Applied Materials on October, 2023 by the United States Patent and Trademark Office.
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US Patent 11782337 Multilayer extreme ultraviolet reflectors
Article
Patent abstract
Extreme ultraviolet (EUV) mask blanks, methods of forming EUV mask blanks and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer reflective stack on a substrate. The multilayer reflective stack comprises a trilayer film including a first film, a second film, and a third film. Some EUV mask blanks include an interface layer on one or more of the first film, the second film and the third film. EUV mask blanks described herein have low Z
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Herng Yau Yoong
Vibhu Jindal
Wen Xiao
Date of Patent
October 10, 2023
Patent Application Number
17470624
Date Filed
September 9, 2021
Patent Citations
Patent Primary Examiner
CPC Code
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