Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Che-Fu Chen0
Wei-Hua Houng0
Date of Patent
December 5, 2023
0Patent Application Number
172282040
Date Filed
April 12, 2021
0Patent Citations
Patent Primary Examiner
CPC Code
Patent abstract
A method includes positioning an end effector at a height lower than a height of a wafer. The end effector is moved to a position under the wafer. A wafer backside property of the wafer is detected by using a sensor on the end effector. The wafer backside property is analyzed to obtain an analysis result.
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