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US Patent 11867626 Complex spatially-resolved reflectometry/refractometry

Overview Structured Data Issues Contributors Activity

Is a

Patent

Date Filed

April 12, 2021

Date of Patent

January 9, 2024

Patent Application Number

17228178

Patent Citations

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US Patent 7126131 Broad band referencing reflectometer

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US Patent 7394551 Vacuum ultraviolet referencing reflectometer

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US Patent 9360768 Inspection method and apparatus

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US Patent 9541500 Method for calibrating a manufacturing process model

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US Patent 9766552 Methods and apparatus for calculating electromagnetic scattering properties of a structure and for reconstruction of approximate structures

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US Patent 9772562 Method and apparatus for measuring a structure on a substrate, models for error correction, computer program products for implementing such methods and apparatus

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US Patent 9939250 Methods and apparatus for calculating electromagnetic scattering properties of a structure and for estimation of geometrical and material parameters thereof

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US Patent 9952518 Inspection method and apparatus and lithographic apparatus

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US Patent 10036962 Inspection apparatus and methods, lithographic system and device manufacturing method

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US Patent 10126659 Method and apparatus for inspection and metrology

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Patent Inventor Names

Christina Porter

Henry C. Kapteyn

Michael Tanksalvala

Margaret M. Murnane

Daniel E. Adams

Elisabeth Shanblatt

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

11867626

Patent Primary Examiner

CPC Code

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