Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Vinodh Ramachandran0
Ananthkrishna Jupudi0
Lean Wui Koh0
Rajesh Kumar Putti0
Prashant Agarwal0
Date of Patent
January 9, 2024
0Patent Application Number
170098510
Date Filed
September 2, 2020
0Patent Primary Examiner
CPC Code
Patent abstract
Methods and apparatus for processing a substrate. For example, a processing chamber can include a power source, an amplifier connected to the power source, comprising at least one of a gallium nitride (GaN) transistor or a gallium arsenide (GaAs) transistor, and configured to amplify a power level of an input signal received from the power source to heat a substrate in a process volume, and a cooling plate configured to receive a coolant to cool the amplifier during operation.
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