Log in
Enquire now
‌

US Patent 11875101 Method for patterning process modelling

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
0
Date Filed
May 25, 2020
0
Date of Patent
January 16, 2024
0
Patent Application Number
17616368
0
Patent Citations
‌
US Patent 10032681 Etch metric sensitivity for endpoint detection
0
‌
US Patent 10007742 Particle flow simulation system and method
0
‌
US Patent 10242142 Predictive 3-D virtual fabrication system and method
0
‌
US Patent 6961116 Lithographic apparatus, device manufacturing method, and device manufactured thereby
0
‌
US Patent 9588438 Optimization flows of source, mask and projection optics
0
Patent Inventor Names
Feng Chen
0
Jan Wouter Bijlsma
0
Matteo Alessandro Francavilla
0
Jen-Shiang Wang
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
11875101
0
Patent Primary Examiner
‌
Leigh M. Garbowski
0

Find more entities like US Patent 11875101 Method for patterning process modelling

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
Open Query Tool
Access by API
Golden Query Tool
Golden logo