Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Arie Jeffrey Den Boef0
Boguslaw Gajdeczko0
Maarten Hoogerland0
Date of Patent
November 1, 2005
0Patent Application Number
104569720
Date Filed
June 9, 2003
0Patent Citations Received
0
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Patent Primary Examiner
Patent abstract
An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment markers. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
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