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US Patent 11880971 Inspection method and system

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
February 14, 2022
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Date of Patent
January 23, 2024
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Patent Application Number
17671522
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Patent Citations
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US Patent 7117477 System and method for lithography simulation
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US Patent 7117478 System and method for lithography simulation
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US Patent 7138629 Testing apparatus using charged particles and device manufacturing method using the testing apparatus
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US Patent 7268807 Photosensor system and drive control method for optimal sensitivity
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US Patent 7526119 Pattern inspection apparatus
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US Patent 8026961 Solid-state image pickup apparatus having effective and non-effective pixel portions, and driving method therefor
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US Patent 8254682 Pattern detecting method and related image processing apparatus
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US Patent 8463035 Digital image processing for calculating a missing color value
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US Patent 8547416 Signal processing apparatus, signal processing method, program, and recording medium for enhancing voice
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US Patent 8629394 Charged particle beam device and method for correcting position with respect to charged particle beam
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•••
Patent Inventor Names
Wei Fang
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Zhao-Li Zhang
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Jack Jau
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11880971
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Patent Primary Examiner
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Howard D Brown, Jr.
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CPC Code
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G06T 2207/10061
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G06T 2207/30148
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G06T 7/001
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G06T 7/0004
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G06T 2207/10004
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