Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Koichi Motoyama0
Chanro Park0
Chih-Chao Yang0
Kenneth Chun Kuen Cheng0
Date of Patent
January 23, 2024
0Patent Application Number
174560160
Date Filed
November 22, 2021
0Patent Citations
Patent Primary Examiner
Patent abstract
A capping layer is on top of a substrate. A first low-k dielectric layer is on top of the capping layer. One or more trenches are within the first low-k dielectric layer. Each of the one or more trenches have a same depth. Each trench of the one or more trenches include a barrier layer on top of the first low-k dielectric layer, a liner layer and a metal layer on top of the liner layer.
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