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US Patent 11886124 Flows of optimization for patterning processes

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
October 21, 2022
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Date of Patent
January 30, 2024
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Patent Application Number
17971361
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Patent Citations
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US Patent 11137690 Flows of optimization for patterning processes
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US Patent 11480882 Flows of optimization for patterning processes
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US Patent 7003758 System and method for lithography simulation
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US Patent 7587704 System and method for mask verification using an individual mask error model
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US Patent 7703069 Three-dimensional mask model for photolithography simulation
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US Patent 8200468 Methods and system for lithography process window simulation
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US Patent 8584056 Fast freeform source and mask co-optimization method
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Patent Inventor Names
Duan-Fu Stephen Hsu
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11886124
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Patent Primary Examiner
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Peter B. Kim
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CPC Code
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G03F 1/70
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G03F 7/20
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G03F 1/24
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G03F 7/70441
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G03F 7/705
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G03F 7/70125
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G03F 1/36
0

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