US Patent 11906753 Optical system in particular for microlithography
Patent 11906753 was granted and assigned to Carl Zeiss SMT on February, 2024 by the United States Patent and Trademark Office.
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US Patent 11906753 Optical system in particular for microlithography
Article
Patent abstract
An optical system, in particular for microlithography, includes a beam splitter, which has at least one light entry surface. The beam splitter is arranged in the optical system so that the angles of incidence with respect to the surface normal which occur at the light entry surface during operation of the optical system lie in the range of 45°±5°. The beam splitter is produced in [
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Johannes Kraus0
Date of Patent
February 20, 2024
0Patent Application Number
172291670
Date Filed
April 13, 2021
0Patent Citations
Patent Primary Examiner
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