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US Patent 9081193 Interferometric systems and methods

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Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9081193
Date of Patent
July 14, 2015
Patent Application Number
13924065
Date Filed
June 21, 2013
Patent Citations Received
‌
US Patent 11906753 Optical system in particular for microlithography
0
Patent Primary Examiner
‌
Thomas K Pham
Patent abstract

Optical systems and methods including interferometric systems and methods are disclosed herein. In some embodiments, the present invention relates to a system comprising at least one light source including a deep ultraviolet light source, a lens device, a beam splitter, and a camera device. The lens device receives first light, directs at least some of that light toward a target location, receives reflected light therefrom, and directs at least some of the reflected light toward a further location, where at least part of a light path between the deep ultraviolet light source and the target location is other than at a high vacuum. The camera device is positioned at either the further location or an additional location, whereby an image is generated by the camera device based upon at least a portion of the reflected light. Also encompassed herein are interferometric lithography and optical microscopy systems.

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