Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Shimada0
Chen-Fon Chang0
Chih-Teng Liao0
Date of Patent
February 20, 2024
0Patent Application Number
171919050
Date Filed
March 4, 2021
0Patent Citations
Patent Primary Examiner
Patent abstract
An etching apparatus is provided to be able to rotate or tilt a substrate holder on which a to-be-processed substrate is placed. According to a profile of a pre-process critical dimension of the substrate, the etching apparatus may rotate or tilt the substrate holder during an etching process in order to achieve a desired profile of a post-process critical dimension of the substrate that is related to the pre-process critical dimension.
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