Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Mihaela Balseanu0
Anchuan Wang0
Dongqing Yang0
Li-Qun Xia0
Ning Li0
Date of Patent
November 20, 2018
Patent Application Number
15455766
Date Filed
March 10, 2017
Patent Citations Received
Patent Primary Examiner
Patent abstract
Methods for forming a spacer comprising depositing a film on the top, bottom and sidewalls of a feature and treating the film to change a property of the film on the top and bottom of the feature. Selectively dry etching the film from the top and bottom of the feature relative to the film on the sidewalls of the feature using a high intensity plasma.
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