Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hong Xiao0
Date of Patent
February 27, 2024
0Patent Application Number
169332970
Date Filed
July 20, 2020
0Patent Citations
...
Patent Primary Examiner
Patent abstract
A device area includes at least a first layer of photoresist and a second layer of photoresist. First layer metrology targets are positioned at an edge of one of the sides of the first layer of the mat. The first layer metrology targets have a relaxed pitch less than a device pitch. Secondary electron and back-scattered electron images can be simultaneously obtained.
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