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US Patent 11914942 Method for predicting resist deformation

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
June 5, 2023
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Date of Patent
February 27, 2024
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Patent Application Number
18206029
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Patent Citations
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US Patent 7625678 Mask data creation method
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US Patent 8200468 Methods and system for lithography process window simulation
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US Patent 8913120 Method for emulation of a photolithographic process and mask inspection microscope for performing the method
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US Patent 10423076 Methods for determining resist deformation
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US Patent 10204197 Coupled-domains disturbance matrix generation for fast simulation of wafer topography proximity effects
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US Patent 10901322 Methods for evaluating resist development
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US Patent 6872014 Method for developing a photoresist pattern
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US Patent 7587704 System and method for mask verification using an individual mask error model
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Patent Inventor Names
Roger Josef Maria Jeurissen
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Chrysostomos Batistakis
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Koen Gerhardus Winkels
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11914942
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Patent Primary Examiner
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Leigh M. Garbowski
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