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US Patent 11940608 Dark field microscope

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
April 2, 2020
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Date of Patent
March 26, 2024
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Patent Application Number
17608038
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Patent Citations
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US Patent 8614790 Optical system and method for inspection of patterned samples
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US Patent 9081303 Methods and scatterometers, lithographic systems, and lithographic processing cells
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US Patent 9709510 Determining a configuration for an optical element positioned in a collection aperture during wafer inspection
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US Patent 9904181 Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method
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US Patent 9946167 Metrology method and inspection apparatus, lithographic system and device manufacturing method
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US Patent 10072921 Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element
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US Patent 10222517 Aperture stop
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US Patent 11428642 Scanning scatterometry overlay measurement
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US Patent 10101676 Spectroscopic beam profile overlay metrology
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US Patent 6961116 Lithographic apparatus, device manufacturing method, and device manufactured thereby
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•••
Patent Inventor Names
Sebastianus Adrianus Goorden
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11940608
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Patent Primary Examiner
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Gordon J Stock, Jr.
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CPC Code
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G03F 7/70641
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G03F 7/7065
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G03F 7/70625
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G02B 21/0016
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G02B 21/002
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G02B 21/0024
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G02B 21/0028
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G02B 21/0032
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G02B 21/0036
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G02B 21/02
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•••

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