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US Patent 11960204 Microlithographic fabrication of structures

Patent 11960204 was granted and assigned to Molecular Imprints on April, 2024 by the United States Patent and Trademark Office.

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Patent abstract

Asymmetric structures formed on a substrate and microlithographic methods for forming such structures. Each of the structures has a first side surface and a second side surface, opposite the first side surface. A profile of the first side surface is asymmetric with respect to a profile of the second side surface. The structures on the substrate are useful as a diffraction pattern for an optical device.

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