US Patent 11972927 Frequency tuning for modulated plasma systems
Patent 11972927 was granted and assigned to ADVANCED ENERGY INDUSTRIES, INC. on April, 2024 by the United States Patent and Trademark Office.
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US Patent 11972927 Frequency tuning for modulated plasma systems
Article
Patent abstract
Plasma processing systems and methods are disclosed. The plasma processing system includes a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator.
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Gideon Van Zyl0
Date of Patent
April 30, 2024
0Patent Application Number
179739690
Date Filed
October 26, 2022
0Patent Citations
Patent Primary Examiner
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