Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tianhua Yu0
Ruopeng Deng0
Yu Pan0
Xiaolan Ba0
Juwen Gao0
Date of Patent
April 30, 2024
0Patent Application Number
173125940
Date Filed
December 13, 2019
0Patent Citations
...
Patent Primary Examiner
Patent abstract
Methods and apparatuses are described that provide tungsten deposition with low roughness. In some embodiments, the methods involve co-flowing nitrogen with hydrogen during an atomic layer deposition process of depositing tungsten that uses hydrogen as a reducing agent. In some embodiments, the methods involve depositing a cap layer, such as tungsten oxide or amorphous tungsten layer, on a sidewall surface of a 3D NAND structure. The disclosed embodiments have a wide variety of applications including depositing tungsten into 3D NAND structures.
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