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US Patent 11972974 Self-aligned barrier for metal vias
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Patent
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Date Filed
January 13, 2022
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Date of Patent
April 30, 2024
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Patent Application Number
17575444
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Patent Citations
US Patent 9236300 Contact plugs in SRAM cells and the method of forming the same
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US Patent 9406804 FinFETs with contact-all-around
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US Patent 9443769 Wrap-around contact
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US Patent 9520482 Method of cutting metal gate
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US Patent 9548366 Self aligned contact scheme
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US Patent 9576814 Method of spacer patterning to form a target integrated circuit pattern
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US Patent 9831183 Contact structure and method of forming
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US Patent 9899258 Metal liner overhang reduction and manufacturing method thereof
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US Patent 9859386 Self aligned contact scheme
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US Patent 10083863 Contact structure for semiconductor device
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Patent Inventor Names
Fang-Wei Lee
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Chia-Hung Chu
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Shuen-Shin Liang
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Mrunal Abhijith Khaderbad
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Sung-Li Wang
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Yu-Yun Peng
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Keng-Chu Lin
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11972974
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Patent Primary Examiner
Younes Boulghassoul
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CPC Code
H01L 21/76843
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H01L 21/76847
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H01L 21/76805
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H01L 21/28562
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H01L 21/76879
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H01L 21/76897
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H01L 21/76816
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H01L 21/823475
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H01L 21/76877
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H01L 23/5226
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•••
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