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US Patent 11985825 3D memory array contact structures

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Is a
Patent
Patent
0

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
119858250
Patent Inventor Names
Yu-Ming Lin0
Feng-Cheng Yang0
Sheng-Chen Wang0
Meng-Han Lin0
Sai-Hooi Yeong0
Han-Jong Chia0
Date of Patent
May 14, 2024
0
Patent Application Number
172315230
Date Filed
April 15, 2021
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Patent Citations
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US Patent 9240420 3D non-volatile storage with wide band gap transistor decoder
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US Patent 10777566 3D array arranged for memory and in-memory sum-of-products operations
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US Patent 10868042 Ferroelectric memory device containing word lines and pass gates and method of forming the same
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US Patent 10998447 Semiconductor device, semiconductor wafer, and electronic device
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US Patent 11011529 Memory arrays comprising vertically-alternating tiers of insulative material and memory cells and methods of forming a memory array comprising memory cells individually comprising a transistor and a capacitor
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US Patent 11171157 Method for forming a MFMIS memory device
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US Patent 11205659 Interconnect structures of three-dimensional memory devices
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US Patent 11211395 3D memory array having select lines
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...
Patent Primary Examiner
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Ali Naraghi
0
CPC Code
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G11C 8/14
0
Patent abstract

A memory array device includes a stack of transistors over a semiconductor substrate, a first transistor of the stack being disposed over a second transistor of the stack. The first transistor includes a first memory film along a first word line and a first channel region along a source line and a bit line, the first memory film being disposed between the first channel region and the first word line. The second transistor includes a second memory film along a second word line and a second channel region along the source line and the bit line, the second memory film being disposed between the second channel region and the second word line. The memory array device includes a first via electrically connected to the first word line and a second via electrically connected to the second word line, the second staircase via and the first staircase via having different widths.

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