Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Takahiro Kimura0
Motohiro Kono0
Akira Horikoshi0
Shigeru Takatsuji0
Kenji Kobayashi0
Shohei Nakamura0
Date of Patent
May 21, 2024
0Patent Application Number
170163790
Date Filed
September 10, 2020
0Patent Citations
...
Patent Primary Examiner
Patent abstract
A liquid film of a processing liquid containing at least one of sulfuric acid, a sulfate, peroxosulfuric acid, and a peroxosulfate, or a processing liquid containing hydrogen peroxide is formed on a substrate. A plasma is radiated to the liquid film. Thereby, a substrate processing method in which substrate processing using an oxidizing power of the processing liquid can be efficiently performed is provided.
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