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US Patent 11990319 Methods and apparatus for processing a substrate

Patent 11990319 was granted and assigned to Applied Materials on May, 2024 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Current Assignee
Applied Materials
Applied Materials
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Date Filed
January 5, 2022
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Date of Patent
May 21, 2024
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Patent Applicant
Applied Materials
Applied Materials
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Patent Application Number
17568836
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Patent Citations
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US Patent 11043387 Methods and apparatus for processing a substrate
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US Patent 7839223 Method and apparatus for advanced frequency tuning
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US Patent 8773019 Feedback control and coherency of multiple power supplies in radio frequency power delivery systems for pulsed mode schemes in thin film processing
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US Patent 11651966 Methods and apparatus for processing a substrate
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Patent Inventor Names
Noufal Kappachali
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Haitao Wang
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Xiangjin Xie
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Yida Lin
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Rui Li
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Martin Lee Riker
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11990319
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Patent Primary Examiner
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Adolf D Berhane
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CPC Code
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B23K 15/0006
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H01J 2237/327
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H01J 37/32183
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