US Patent 11991877 DRAM circuitry and method of forming DRAM circuitry

DRAM circuitry comprises a memory array comprising memory cells individually comprising a transistor and a charge-storage device. The transistors individually comprise two source/drain regions having a gate there-between that is part of one of multiple wordlines of the memory array. One of the source/drain regions is electrically coupled to one of the charge-storage devices. The other of the source/drain regions is electrically coupled to one of multiple sense lines of the memory array. Peripheral circuitry comprises wordline-driver transistors having gates which individually comprise one of the wordlines and comprises sense-line-amplifier transistors having gates which individually comprise one of the sense lines. The sense-line-amplifier transistors and the wordline-driver transistors individually are a finFET having at least one fin comprising a channel region of the respective finFET. The sense-line-amplifier transistors and the wordline-driver transistors individually comprise two source/drain regions that individually comprise conductively-doped epitaxial semiconductor material that is adjacent one of two laterally-opposing sides of the at least one fin in a vertical cross-section. Methods are also disclosed.