Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chao-Cheng Chen0
Ming-Ching Chang0
Chih-Han Lin0
Date of Patent
June 11, 2024
0Patent Application Number
173451880
Date Filed
June 11, 2021
0Patent Citations
Patent Primary Examiner
Patent abstract
A semiconductor device includes a fin extending from a substrate, a gate stack over and along a sidewall of the fin, a spacer along a first sidewall of the gate stack and the sidewall of the fin, a dummy gate material along the sidewall of the fin, wherein the dummy gate material is between the spacer and the gate stack, and a first epitaxial source/drain region in the fin and adjacent the gate stack.
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