US Patent 12024770 Methods for selective deposition using self-assembled monolayers
Patent 12024770 was granted and assigned to Applied Materials on July, 2024 by the United States Patent and Trademark Office.
All edits
Edits on 4 Jul, 2024
Golden AI
Edits made to:
Infobox (+42 properties)
Article (+596 characters)
US Patent 12024770 Methods for selective deposition using self-assembled monolayers
Article
Patent abstract
Methods and apparatus for selectively depositing a layer atop a substrate having a metal surface and a dielectric surface is disclosed, including: (a) contacting the metal surface with one or more metal halides such as metal chlorides or metal fluorides to form an exposed metal surface; (b) growing an organosilane based self-assembled monolayer atop the dielectric surface; and (c) selectively depositing a layer atop the exposed metal surface of the substrate, wherein the organosilane based self-assembled monolayer inhibits deposition of the layer atop the dielectric surface.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chang Ke0
Liqi Wu0
Wenyu Zhang0
Date of Patent
July 2, 2024
0Patent Application Number
165354990
Date Filed
August 8, 2019
0Patent Citations
Patent Primary Examiner
CPC Code
Find more entities like US Patent 12024770 Methods for selective deposition using self-assembled monolayers
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
