Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shih-Hao Yang0
Jheng-Yuan Chen0
Chih-Chiang Tu0
Chun-Lang Chen0
Date of Patent
August 20, 2024
0Patent Application Number
183086350
Date Filed
April 27, 2023
0Patent Citations
Patent Primary Examiner
Patent abstract
A mask includes a reflective layer, an absorption layer and an absorption part. The absorption layer is disposed over the reflective multilayer. The absorption part is disposed in the reflective layer and the absorption layer, wherein an entire top surface of the absorption part is substantially flush with a top surface of the absorption layer.
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