US Patent 12066757 Mask and method of forming the same
Patent 12066757 was granted and assigned to Taiwan Semiconductor Manufacturing Company on August, 2024 by the United States Patent and Trademark Office.
All edits
Edits on 21 Aug, 2024
Golden AI
Edits made to:
Infobox (+22 properties)
Article (+361 characters)
US Patent 12066757 Mask and method of forming the same
Article
Patent abstract
A mask includes a reflective layer, an absorption layer and an absorption part. The absorption layer is disposed over the reflective multilayer. The absorption part is disposed in the reflective layer and the absorption layer, wherein an entire top surface of the absorption part is substantially flush with a top surface of the absorption layer.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chih-Chiang Tu0
Chun-Lang Chen0
Jheng-Yuan Chen0
Shih-Hao Yang0
Date of Patent
August 20, 2024
0Patent Application Number
183086350
Date Filed
April 27, 2023
0Patent Citations
Patent Primary Examiner
Find more entities like US Patent 12066757 Mask and method of forming the same
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
