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US Patent 12087556 Plasma processing apparatus and plasma processing method
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Patent
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Date Filed
June 23, 2021
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Date of Patent
September 10, 2024
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Patent Application Number
17356195
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Patent Citations
US Patent 7886690 Plasma source
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US Patent 7268083 Plasma etching apparatus and plasma etching process
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US Patent 8636872 Upper electrode and plasma processing apparatus
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US Patent 6930047 Dry etching apparatus, etching method, and method of forming a wiring
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US Patent 7195673 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same
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Patent Inventor Names
Akio Ui
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Yosuke Sato
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Hisataka Hayashi
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
12087556
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Patent Primary Examiner
Thomas T Pham
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CPC Code
H01L 21/3065
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H01J 37/32577
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