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US Patent 12087871 Microstructure enhanced absorption photosensitive devices

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Contents

Is a
Patent
Patent
0

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
120878710
Patent Inventor Names
Shih-Yuan Wang0
Shih-Ping Wang0
Date of Patent
September 10, 2024
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Patent Application Number
183852130
Date Filed
October 30, 2023
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Patent Citations
‌
US Patent 8129710 Plasmon enhanced nanowire light emitting diode
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US Patent 6879014 Semitransparent optical detector including a polycrystalline layer and method of making
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US Patent 7396696 Method for manufacturing super bright light emitting diode of nanorod array having InGaN quantum well
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US Patent 7525170 Pillar P-i-n semiconductor diodes
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US Patent 8022390 Lateral conduction infrared photodetector
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US Patent 8207064 3D polysilicon diode with low contact resistance and method for forming same
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US Patent 8357960 Multispectral imaging device and manufacturing thereof
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US Patent 8558336 Semiconductor photodetector structure and the fabrication method thereof
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...
Patent Primary Examiner
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Eduardo A Rodela
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CPC Code
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H01L 31/02363
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H01L 31/028
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H01L 31/035281
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H01L 31/105
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H01L 31/02019
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H01L 27/1446
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H01L 27/146
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H01L 27/14607
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Patent abstract

Techniques for enhancing the absorption of photons in semiconductors with the use of microstructures are described. The microstructures, such as pillars and/or holes, effectively increase the effective absorption length resulting in a greater absorption of the photons. Using microstructures for absorption enhancement for silicon photodiodes and silicon avalanche photodiodes can result in bandwidths in excess of 10 Gb/s at photons with wavelengths of 850 nm, and with quantum efficiencies of approximately 90% or more.

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