Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Toshimasa Kobayashi0
Kazuki Takahashi0
Date of Patent
September 17, 2024
0Patent Application Number
182328340
Date Filed
August 11, 2023
0Patent Citations
Patent Primary Examiner
Patent abstract
A plasma processing apparatus includes: a processing container in which a mounting stage mounted with a substrate is provided and a plasma process is performed on the substrate; an exhaust passage which is provided around the mounting stage and through which a gas containing a by-product released by the plasma process flows; and a first adsorption member which is arranged along an inner wall surface of the exhaust passage and of which a surface is roughened to adsorb the by-product.
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