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US Patent 12124172 Lithographic apparatus and ultraviolet radiation control system

Patent 12124172 was granted and assigned to ASML Holding on October, 2024 by the United States Patent and Trademark Office.

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Patent Applicant

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Current Assignee

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Alexander Kremer0

Date of Patent

October 22, 2024

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Patent Application Number

176347020

Date Filed

August 5, 2020

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Patent Citations

US Patent 7511799 Lithographic projection apparatus and a device manufacturing method

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US Patent 7554093 Uniformly responsive ultraviolet sensors

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US Patent 9823121 Method and system for measuring radiation and temperature exposure of wafers along a fabrication process line

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US Patent 10082424 Diamond-based monitoring apparatus for lithographic apparatus, and a lithographic apparatus comprising diamond-based monitoring apparatus

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Patent abstract

The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (

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